发明名称 |
METHODS OF FORMING MICROSTRUCTURE DEVICES |
摘要 |
The invention includes methods of forming microstructure devices. In an exemplary method, a substrate is provided which includes a first material and a second material. At least one of the first and second materials is exposed to vapor-phase alkylsilane-containing molecules to form a coating over the at least one of the first and second materials. |
申请公布号 |
WO02090245(A2) |
申请公布日期 |
2002.11.14 |
申请号 |
WO2002US14142 |
申请日期 |
2002.05.01 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LEUNG, TOI, YUE, BECKY;CHINN, JEFFREY, D. |
分类号 |
B81B3/00;B81C1/00 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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