METHOD FOR FABRICATING ACTIVE MATRIX TYPE LIQUID CRYSTAL DISPLAY DEVICE

摘要

PURPOSE: A method for fabricating an active matrix type liquid crystal display device is provided to carry out the etching by using four masks in the same equipment for reducing the fabricating steps and cost. CONSTITUTION: A method for fabricating an active matrix type liquid crystal display device includes the steps of forming gate electrodes on an insulating substrate by using a first mask, depositing a gate insulating film, an active layer, and a source/drain metal layer on the entire surface of the substrate including the gate electrodes, alternatively forming a second mask on the source/drain metal layer, etching the active layer and the source/drain metal layer in sequence by using the second mask and etching the second mask to alternatively expose the source/drain metal layer surface, etching the source/drain metal layer by using the etched second mask to expose the gate insulating film, forming a protecting film(28) having contact holes by using a third mask to expose to ether source/drain metal layer, and forming pixel electrodes(29a) by using a fourth mask to be connected to the source/drain metal layer via the contact holes.