Substrate processing apparatus, a processing chamber and a method of manufacturing a coated substrate,申请号KR20057014740-传众专利搜索

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发明名称	Substrate processing apparatus, a processing chamber and a method of manufacturing a coated substrate
摘要
申请公布号	KR100761187(B1)	申请公布日期	2007.09.21
申请号	KR20057014740	申请日期	2005.08.10
申请人		发明人
分类号	C23C14/00;B65H1/00;C23C14/56;C23C16/00;C23C16/458;C23C16/54;C23F1/00;G11B5/84;H01L21/00	主分类号	C23C14/00
代理机构		代理人
主权项
地址

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