RESIST COMPOSITION, METHOD OF FABRICATING RESIST PATTERN USING THE SAME AND ARRAY SUBSTRATE FABRICATED USING THE SAME

摘要

A resist composition is provided to stably separate a mold and extend the lifetime of the mold and to improve adhesion of a base layer and a resist pattern in an imprinting lithography process. A resist composition includes UV(ultraviolet) curable resin and an additive, containing an adhesion increasing agent for inducing a chemical combination of the UV curable resin and a coated layer. The adhesion increasing agent can be one of an epoxy-based compound or a urethane-based compound. The additive can include at least one of an initiator and a coupling agent.