Device for controlling laser beam and apparatus for generating extreme ultraviolet light utilizing wavefront adjusters

摘要

A device is provided for controlling a laser beam. The device may include a first wavefront adjuster provided in a beam path of a laser beam outputted from a laser apparatus, a beam delivery unit provided in a beam path of the laser beam from the first wavefront adjuster, a second wavefront adjuster provided in a beam path of the laser beam from the beam delivery unit, a beam monitor provided in a beam path of the laser beam from the second wavefront adjuster, and a controller configured to control the first and second wavefront adjusters based on a detection result of the beam monitor. An extreme ultraviolet light apparatus including the device is also provided.

主权项

1. A device for controlling a laser beam, comprising:
a first wavefront adjuster provided in a beam path of a laser beam outputted from a laser apparatus; a beam delivery unit provided in a beam path of the laser beam from the first wavefront adjuster; a second wavefront adjuster provided in a beam path of the laser beam from the beam delivery unit; a beam monitor provided in a beam path of the laser beam from the second wavefront adjuster, the beam monitor configured to output a detection result; and a controller configured to control the first wavefront adjuster based on a beam width calculation and the second wavefront adjuster based on a beam spot width calculation, with each calculation based on the detection result of the beam monitor.