| 摘要 |
An embodiment of a substrate processing device according to the present invention can comprise: a first disk which is arranged to rotate; a second disk which is arranged on the first disk, and when the first disk rotates, rotates on its axis and revolves around a center of the first disk, wherein a substrate is placed on an upper surface of the second disk; a metal ring which is coupled with a lower portion of the second disk, wherein a center of the metal ring is arranged to coincide with a center of the second disk; a magnet which is arranged on a lower portion of the metal ring such that the magnet is apart from the metal ring in a vertical direction and faces the metal ring, wherein the magnet is coupled with a support mount, which is arranged in a lower portion of the first disk, to be fixed on support mount, such that the magnet does not move when the first disk and the second disk rotate or evolve; and a bearing which is arranged to touch the first disk and the second disk, respectively, such that the bearing rolls when the second disk rotates with respect to the first disk. An objective of the present invention is to provide a substrate processing device which is arranged inside a process chamber to rotate the second disk without using a separate device for spraying air or other gases. |
