发明名称 Application of super lattice films on insulator to lateral bipolar transistors
摘要 A lateral bipolar junction transistor including a base region on a dielectric substrate layer. The base region includes a layered stack of alternating material layers of a first lattice dimension semiconductor material and a second lattice dimension semiconductor material. The first lattice dimension semiconductor material is different from the second lattice dimension semiconductor material to provide a strained base region. A collector region is present on the dielectric substrate layer in contact with a first side of the base region. An emitter region is present on the dielectric substrate in contact with a second side of the base region that is opposite the first side of the base region.
申请公布号 US9425260(B2) 申请公布日期 2016.08.23
申请号 US201414208704 申请日期 2014.03.13
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 Chan Kevin K.;Hekmatshoartabari Bahman;Ning Tak H.
分类号 H01L27/082;H01L29/15;H01L29/735;H01L29/165;H01L29/205;H01L29/10;H01L29/161;H01L29/737;H01L29/66;H01L21/02 主分类号 H01L27/082
代理机构 Tutunjian & Bitetto, P.C. 代理人 Tutunjian & Bitetto, P.C. ;Percello Louis J.
主权项 1. A lateral bipolar junction transistor comprising: a base region on a dielectric substrate layer, wherein the base region includes a layered stack of alternating material layers that repeat at least once of a first lattice dimension material and a second lattice dimension material, wherein the first lattice dimension material is different from the second lattice dimension material to provide a strained base region; a collector region is present on the dielectric substrate layer in contact with a first side of the base region; and an emitter region is present on the dielectric substrate in contact with a second side of the base region that is opposite the first side of the base region.
地址 Armonk NY US