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发明名称
Verfahren zum Herstellen von diffundierten Halbleiterbauelementen unter Verwendung von festen Dotierstoffquellen
摘要
申请公布号
CH519249(A)
申请公布日期
1972.02.15
申请号
CH19710001586
申请日期
1971.02.03
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
ROSENBERGER,GEORG;SOEHLBRAND,HEINRICH,DR.
分类号
H01L21/225;(IPC1-7):H01L7/34;H01L11/06
主分类号
H01L21/225
代理机构
代理人
主权项
地址
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