Magnetron sputtering targets.

摘要

A magnetron sputter coating device having a target 11 of material to be sputtered and a magnetic means 21, 24, 35 for producing a closed-loop magnetic tunnel capable of confining a glow discharge adjacent a surface of the target 11 is disclosed. A groove 3 is provided in the surface of the target 11 along at least part of the erosion region. The groove 3 affects the sputtering voltage and profile of the sputtering surface as it erodes. The dimensions and location of the groove 3 can be selected to optimize the effects for particular magnetron sputtering devices.