| 摘要 |
<p>PURPOSE:To prevent a thin supporting film from being damaged by forming an air vent hole in a sample stand to connect the surface of a thin supporting film with the atmosphere, and providing a mechanism for closing the hole during etching and opening it after the etching is completed. CONSTITUTION:An air vent hole 7 having 2mm of diameter is formed at the center of a sample stand 5, and the bottom of the hole 7 is sealed with a threaded bolt 8 having 5mm of length. After it is etched with the etching device, the bolt 8 is removed, and air is fed to a space between the surface of a thin supporting film and the stand 5. Then, when the sample is removed, the pressure applied to the film 2 can be reduced. Thus, the damage to the film can be eliminated. As a result, the manufacture of an X-ray mask can be easily executed with high yield.</p> |
