摘要 |
<p>A penam derivative of the following general formula or a salt thereof is described <IMAGE> in which R<1> is a hydrogen atom, an amino protective group or an acyl group; R<2> is a hydrogen atom or a lower alkyl group; R<3> is a hydrogen atom, a lower alkoxy group, a lower alkylthio group or a formamido group; R<4> is a protected or unprotected carboxyl group or a carboxylato group; R is a group of the formula -NHR<5> or -NR<5>R<6> (where R<5> and R<6>, which can be identical or different, are protected or unprotected hydroxyl groups, cyano groups, sulpho groups or unsubstituted or substituted lower alkyl, aryl, acyl, carbamoyl, sulphamoyl, lower alkylsulphonyl or heterocyclic groups) or is a group of the formula -N=CR<7>R<8> (where R<7> and R<8>, which can be identical or different, are hydrogen atoms or protected or unprotected carboxyl groups, cyano groups or substituted or unsubstituted lower alkyl, lower alkenyl, lower alkynyl, aryl, amino, acyl, acyloxy, carbamoyl, carbamoyloxy, sulphamoyl, lower alkylthio, ureido or heterocyclic groups, or where R<7> and R<8> can form with the carbon atom to which R<7> and R<8> are bonded a cycloalkene or a heterocyclic ring); and n is 1 or 2. ... Original abstract incomplete.</p> |
申请人 |
TOYAMA CHEMICAL CO. LTD., TOKIO/TOKYO, JP |
发明人 |
OCHIAI, HIROKAZU;WATANABE, YASUO;MUROTANI, YOSHIHARU;FUKUDA, HIROHIKO;YOSHINO, OSAMU;MINAMI, SHINZABURO, TOYAMA, JP;HAYASHI, TOSHIO, TAKAOKA, JP;MOMONOI, KAISHU, SHINMINATO, JP |