| 摘要 |
PROBLEM TO BE SOLVED: To obtain a fine pattern with a good form even on a special substrate and to form a pattern with excellent storage stability and high sensitivity by incorporating a specified compd. having such a structure that at least one bond of -NH- is directly bonded to a specified one in the molecule. SOLUTION: This improving agent for the dependence of a resist on a substrate contains a compd. having at least one structure in the molecule that at lest one bond of -NH- is directly bonded to at least one of -C(=O)-, -C(=S)- and -SO2 -. The compd. is, for example, expressed by the formula. In the formula, X is oxygen atom or sulfur atom, A is a satd. or unsatd. five or six-member ring which may contain oxygen atoms, nitrogen atoms or sulfur atoms as the structural atoms. When this resist compsn. is used as a resist material for exposure on a special substrate, a pattern form with good accuracy or in a quater- micron size can be obtd. while high resolution and high sensitivity are maintained. |
