发明名称 Layered structure comprising insulator thin film and oxide superconductor thin film
摘要 A layered structure formed on a substrate comprising an oxide superconductor thin film deposited on the substrate, a noble metal monolayer deposited on the oxide superconductor thin film and an insulator thin film deposited on the noble metal monolayer. The noble metal monolayer prevents interdiffusion between the oxide superconductor thin film and the insulator thin film so that they have excellent properties.
申请公布号 US5480861(A) 申请公布日期 1996.01.02
申请号 US19940274781 申请日期 1994.07.14
申请人 SUMITOMO ELECTRIC INDUSTRIES LTD. 发明人 TANAKA, SO;IIYAMA, MICHITOMO
分类号 C01G1/00;C01G3/00;C30B29/22;H01B12/06;H01B13/00;H01L39/14;H01L39/22;H01L39/24;(IPC1-7):H01B12/00;B05D5/12;H01L29/06 主分类号 C01G1/00
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