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发明名称
A PROCESS FOR PHOTORESIST REMOVAL
摘要
申请公布号
KR20000076362(A)
申请公布日期
2000.12.26
申请号
KR19997008464
申请日期
1999.09.17
申请人
发明人
分类号
G03F7/42;H01L21/027;H01L21/304;H01L21/306;H01L21/311
主分类号
G03F7/42
代理机构
代理人
主权项
地址
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