VAPOR SOURCE FOR CHEMICAL VAPOR DEPOSITION,申请号KR1020007005938-传众专利搜索

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发明名称	VAPOR SOURCE FOR CHEMICAL VAPOR DEPOSITION
摘要
申请公布号	KR20010032659(A)	申请公布日期	2001.04.25
申请号	KR1020007005938	申请日期	2000.05.31
申请人		发明人
分类号	C23C16/44	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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