发明名称 DEVICE AND METHOD FOR OBSERVING SPECIMEN, METHOD FOR MANUFACTURING DEVICE FOR OBSERVING SPECIMEN, DEVICE AND METHOD FOR MEASURING POSITION, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING MICRO DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a device and a method for observing a specimen by which the position of a substrate is accurately detected irrespective of the presence of a ghost light beam, and to provide a method for manufacturing a device for observing a specimen, a device and a method for measuring a position, an exposure device, and a method for manufacturing a micro device. SOLUTION: An alignment sensor 40 comprises an irradiation optical system 43 which irradiates a substrate W with illuminating flux B1 from a light source system 42, a light- receiving optical system 44 which condenses reflected light B2 based on the illuminating flux B1 from the substrate W, and guide it to detection surfaces DX, DY, and DZ, and a Z position measurement system 60 and an XY position measurement system 70 which detect the position and the intensity of light B2 reflected on the detection surfaces DX, DY and DZ. The alignment sensor 40 is further provided with luminous flux shift members 45Y and 45Z which control the relative positional relationship between the detection position of the light B2 reflected on the detection surfaces DX, DY and DZ, and the arrival area of the ghost light beam on the detection surfaces DX, DY and DZ, and a luminous flux shift member control system 46. The exposure device is constructed by using the alignment sensor 40.
申请公布号 JP2002202462(A) 申请公布日期 2002.07.19
申请号 JP20000404950 申请日期 2000.12.29
申请人 NIKON CORP 发明人 NAKAMURA AYAKO
分类号 G01B11/00;G02B21/06;G02B21/26;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G02B21/26 主分类号 G01B11/00
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