| 摘要 |
PROBLEM TO BE SOLVED: To supply treatment gas which is optimal according to the kind of plasma processing and processing conditions of a substrate for flat panel display. SOLUTION: An upper electrode 300 disposed inside a processing chamber 200 has an electrode plate 310 facing a lower electrode 212, an electrode supporter 320 supporting the electrode plate, a buffer chamber 330 formed between the electrode supporter and the electrode plate whereto processing gas is introduced, and a loop-like partition wall 350 for partitioning the buffer chamber 330 into a plurality of chambers. The partition wall is interposed and held between the electrode supporter and the electrode plate. COPYRIGHT: (C)2008,JPO&INPIT |
