Substrate processing apparatus

摘要

After an exposure process in an exposure part, the exposure part transmits an exposure completion signal to a main controller. At time (t12) which is a predetermined time interval (T12) later than an exposure completion time (t11), the main controller transmits a substrate transport signal to a heating part, to cause the transport of a substrate from a temporary substrate rest part to a heating plate and the start of a heating process by the heating plate. This provides substantially the same length of the time interval between the completion of the exposure process and the start of the heating process in the heating part, if there are variations in the time at which each substrate is placed on the temporary substrate rest part of the heating part.