| 摘要 |
Disclosed are a position adjusting unit for a sensor and a chemical mechanical polishing apparatus having the same. According to an embodiment of the present invention, the position adjusting unit includes: a first bracket in which a sensor is mounted; and a position adjusting module connected to the first bracket and adjusting a three-dimensional position of the sensor by rotating the first bracket. According to an embodiment of the present invention, a position adjusting module is miniaturized, and space utilization can be increased. |
