发明名称 Light sensor with chemically resistant and robust reflector stack
摘要 A light sensor having a chemically resistant and robust reflector stack is disclosed. The reflector stack is formed over a substrate, and includes an adhesion layer, a patterned reflector layer over the adhesion layer, and a smoothing layer over the patterned reflector layer. The patterned reflector layer has a substantially flat top surface. A conformal passivation layer covers the reflector stack. An absorbing layer is situated above the reflector stack and separated from the reflector stack. The absorbing layer is supported by vias over the substrate. The absorbing layer is connected to at least one resistor, where a resistance of the at least one resistor varies in response to light absorbed by the absorbing layer. The vias are disposed on via landing pads on the substrate.
申请公布号 US9377350(B2) 申请公布日期 2016.06.28
申请号 US201514827112 申请日期 2015.08.14
申请人 Newport Fab, LLC 发明人 Howard David J.;Rose Jeff;Kar-Roy Arjun;DeBar Michael J.
分类号 G01J1/04 主分类号 G01J1/04
代理机构 Bever, Hoffman & Harms, LLP 代理人 Bever, Hoffman & Harms, LLP
主权项 1. A light sensor comprising: a reflector stack over a substrate, said reflector stack having an adhesion layer, a patterned reflector layer over said adhesion layer, and a smoothing layer over said patterned reflector layer; a conformal passivation layer covering said reflector stack; an absorbing layer above said reflector stack and separated from said reflector stack.
地址 Newport Beach CA US