Lithographischer Prozess mit verbesserter Bildqualität.
摘要
A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements which are smaller than the resolution of the lithography to be employed in order to control the transmittance of the actinic light exposure area.
申请公布号
DE3854211(T2)
申请公布日期
1996.02.29
申请号
DE19883854211T
申请日期
1988.05.10
申请人
INTERNATIONAL BUSINESS MACHINES CORP., ARMONK, N.Y., US
发明人
LIN, BURN JENG, SCARSDALE NEW YORK 10583, US;MORUZZI, ANNE MARIE, WAPPINGER FALLS NEW YORK 12590, US;ROSENBLUTH, ALAN EDWARD, YORKTOWN HEIGHTS NEW YORK 10598, US
