| 发明名称 |
PHOTOMASK LAYOUTS AND METHODS OF FORMING PATTERNS USING THE SAME |
| 摘要 |
A photomask layout includes: a substrate region; a lower stepped region at a region of the substrate region; and a pattern region at least partially crossing the lower stepped region and including at least one notch portion at an area overlapping the lower stepped region. A method of forming a pattern is also provided. |
| 申请公布号 |
US2016233103(A1) |
申请公布日期 |
2016.08.11 |
| 申请号 |
US201514802815 |
申请日期 |
2015.07.17 |
| 申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
Yu Man-Jong |
| 分类号 |
H01L21/308;H01L21/3213;G03F1/38;H01L21/768 |
主分类号 |
H01L21/308 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photomask layout comprising:
a substrate region; a lower stepped region at a region of the substrate region; and a pattern region at least partially crossing the lower stepped region, the pattern region including at least one notch portion at an area overlapping the lower stepped region. |
| 地址 |
Yongin-City KR |
