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发明名称
Verfahren zum Herstellen einer Oxidmaskierung auf einer Halbleiteroberflaeche durch partielles AEtzen
摘要
申请公布号
DE1937435(B)
申请公布日期
1970.11.26
申请号
DE19691937435
申请日期
1969.07.23
申请人
DEUTSCHE ITT INDUSTRIES GMBH
发明人
CALON,GEORGES
分类号
主分类号
代理机构
代理人
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