发明名称 INCREASED SENSITIVITY PHOTOCATHODE STRUCTURE
摘要 A photocathode substrate includes a plurality of prisms to refract radiation before it impinges upon a photocathode material. The refraction causes most of the radiation to meet the photocathode material at an angle other than 90 DEG so that internal reflection of the energy within the photocathode material occurs. This greatly enhances the probability of electrons being released from the photocathode material.
申请公布号 US3700947(A) 申请公布日期 1972.10.24
申请号 USD3700947 申请日期 1971.04.08
申请人 BENDIX CORP.:THE 发明人 GEORGE W. GOODRICH;WILLIAM B. COLSON;CALVIN C. MATLE
分类号 H01J40/06;(IPC1-7):H01J43/00 主分类号 H01J40/06
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