发明名称 |
INCREASED SENSITIVITY PHOTOCATHODE STRUCTURE |
摘要 |
A photocathode substrate includes a plurality of prisms to refract radiation before it impinges upon a photocathode material. The refraction causes most of the radiation to meet the photocathode material at an angle other than 90 DEG so that internal reflection of the energy within the photocathode material occurs. This greatly enhances the probability of electrons being released from the photocathode material.
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申请公布号 |
US3700947(A) |
申请公布日期 |
1972.10.24 |
申请号 |
USD3700947 |
申请日期 |
1971.04.08 |
申请人 |
BENDIX CORP.:THE |
发明人 |
GEORGE W. GOODRICH;WILLIAM B. COLSON;CALVIN C. MATLE |
分类号 |
H01J40/06;(IPC1-7):H01J43/00 |
主分类号 |
H01J40/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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