METHOD AND APPARATUS FOR DETECTION OF DEVELOPMENT END-POINT

摘要

PURPOSE:To enhance the detection accuracy of a development end-point at a photoresist. CONSTITUTION:A dark-field optical system is installed between a photoresist film 13 coated with a developing solution 14 and a light source 2; the change with the passage of time of a photoresist pattern as the progress of a developing operation is detected as a change in the amount of light of irregular reflection caused from the surface of said photoresist film 13.