发明名称 RADIATION-SENSITIVE COMPOSITIONS CONTAINING FULLY SUBSTITUTED NOVOLAK POLYMERS
摘要 A radiation-sensitive composition dissolved in a solvent comprising: (A) a photoactive compound; (B) an alkali-soluble novolak binder resin made by the condensation reaction of a mixture of phenolic monomers and phenolic dimers with an aldehyde source, said mixture of phenolic monomers and phenolic dimers comprising: (1) 2-25% by weight of said mixture being at least one monofunctional phenolic monomer; (2) about 98-75% by weight of said mixture comprising a mixture of difunctional phenolic monomers or dimers comprising: (a) about 0.1% to about 25% by weight of said total mixture being ortho-mono(lower alkyl) phenol; (b) about 10% to about 50% by weight of said total mixture being selected from the group consisting of a para-mono-substituted (lower alkyl) phenol, 2,2'-dihydroxy-5,5'-di(lower alkyl) diphyenyl methane, 3,4-di(lower alkyl) phenol, 5-indanol, 3,4,5-tri(lower alkyl) phenol, and mixtures thereof; (c) about 30% to about 80% by weight of the total mixture being 2,3,5-tri(lower alkyl) phenol, 2,3-di(lower alkyl) phenol, 2,5-di(lower alkyl) phenol, and mixtures thereof. the amount of said aldehyde source being at least a stoichiometric amount to react with all of said phenolic moieties; and wherein the photoactive compound makes up from about 5% to about 40% by weight of the solids in said radiation-sensitive composition; and the alkali-soluble novolak resin makes up from about 95% to about 60% by weight of the solids in said radiation-sensitive composition.
申请公布号 US5237037(A) 申请公布日期 1993.08.17
申请号 US19910713891 申请日期 1991.06.12
申请人 OCG MICROELECTRONIC MATERIALS, INC. 发明人 EBERSOLE, CHARLES E.
分类号 G03F7/023;H01L21/027;H01L21/30 主分类号 G03F7/023
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