发明名称 |
SUBSTRATE FOR HYBRID OPTICAL INTEGRATION AND ITS PRODUCTION |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate for hybrid optical integration which is increased in the specific resistance of an Si substrate and is lowered in the transmission loss of electric wirings for high frequencies and a process for producing the same. SOLUTION: This substrate for hybrid optical integration constituted by forming an optical waveugide 8 on the Si substrate 1 and forming the electric wirings 10 for high frequencies on the same substrate is the substrate for hybrid optical integration which is increased in the specific resistance of the Si substrate 1 and is lowered in the transmission loss of the electric wirings 10 for high frequencies. This process for producing the substrate for hybrid optical integration constituted by forming the optical waveguide 8 on the Si substrate 1 and forming the electric wirings 10 for high frequencies on the same substrate has a heating-up stage for heating the Si substrate 1 to >=500 deg.C and a cooling stage for rapidly passing the temp. region where the donors occurring on electrically active oxygen generate so as not to generate the donors, after the heating-up stage. |
申请公布号 |
JPH09178966(A) |
申请公布日期 |
1997.07.11 |
申请号 |
JP19950336953 |
申请日期 |
1995.12.25 |
申请人 |
NIPPON TELEGR & TELEPH CORP <NTT> |
发明人 |
MINO SHINJI;OOYAMA TAKAHARU;AKAHORI YUJI;YAMADA YASUBUMI |
分类号 |
G02B6/122;G02B6/13;G02F1/035;H01L27/15;(IPC1-7):G02B6/122 |
主分类号 |
G02B6/122 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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