发明名称 RESIN PARTICLE AND ITS APPLICATION
摘要 <p>PROBLEM TO BE SOLVED: To obtain resin particles excellent in such a physical property as polymerization stability, yield, uniformity of particle size, etc., by subjecting a polymerizable monomer to suspension polymerization in the presence of an aromatic compound having each group of NO2 , SO3 Na and secondary amino. SOLUTION: The objective resin particles are obtained by adding 0.0001 to 10 pts.wt of an aromatic compound having at least each one group of NO2 , SO3 Na and secondary amino (preferably, a compound of the formula) to 100 pts.wt. of a polymerizable monomer and subjecting the polymerizable monomer (preferably, styrene-based monomer, acrylic acid-based or methacrylic acid-based monomer) to suspension polymerization in an aqueous medium at 10 to 90 deg.C, preferably, about 30 to 80 deg.C.</p>
申请公布号 JPH10324704(A) 申请公布日期 1998.12.08
申请号 JP19980008034 申请日期 1998.01.19
申请人 NIPPON SHOKUBAI CO LTD 发明人 IKEDA ISATO;KUSHINO MITSUO;URASHIMA NOBUAKI;MORI YOSHIKUNI
分类号 G03G9/087;C08F2/18;C08F2/40;C08F2/44;G03G9/09;(IPC1-7):C08F2/18 主分类号 G03G9/087
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