| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner for well overlap exposure by suppressing aberration of an imaging optical system, which regulates a lighting region on a mask or unevenness in exposure amount at an overlap exposure part caused by fluctuations in magnification. SOLUTION: An aligner is provided, where a transfer pattern of a mask (R) is exposed duplicatively on a photosensitized board (P) so that a pattern larger than a transfer pattern on the mask is exposed on the photosensitized board. Lighting optical systems (21-33) comprises a lighting region regulating means (30), which is provided at a position almost in optically conjugate with the mask and regulates a prescribed region corresponding to a lighting region which is to be formed on the mask, and an imaging optical system (100), which projects the specified region regulated by the lighting region regulating means on the mask, so that the lighting region is formed on the mask. Adjusting means (41 and 45) are provided which adjust optical characteristics in the lighting region, formed on the mask or in the exposure region formed on the photosensitized board.
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