WIPING METHOD, WIPING APPARATUS, PLOTTING APPARATUS PROVIDED WITH THE SAME, METHOD FOR MANUFACTURING OPTOELECTRONIC APPARATUS, OPTOELECTRONIC APPARATUS AND ELECTRONIC EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a wiping method by which a minute bound generated between a functional liquid droplet discharging head and a wiping sheet to be pressed to the functional liquid droplet discharging head can be absorbed and to provide a wiping apparatus, a plotting apparatus provided with the wiping apparatus, a method for manufacturing an optoelectronic apparatus, the optoelectronic apparatus and electronic equipment.

SOLUTION: The wiping sheet 111 to be fed to one direction is pressed to the surface 47 of a nozzle of the functional liquid droplet discharging head 31 by using a wiping roller 151 and a shock absorbing mechanism 154 capable of absorbing the shock to be given to the wiping roller 151 so that the wiping sheet is caused to wipe the surface 47 of the nozzle.

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