| 摘要 |
PROBLEM TO BE SOLVED: To provide a beam space charge neutralization device capable of increasing a beam current by suppressing the divergence of an ion beam neutralizing beam space charge for improving beam transport efficiency. SOLUTION: This invention is applied to an AEF (angle energy filter) provided in the middle of a beam path in an ion implanting device irradiating an ion beam on a wafer to treat it and selecting only ions of required energy species from the ion beam by at least a magnetic field between an electric field and the magnetic field. A plasma shower for beam space charge neutralization is provided in an AEF chamber. In the plasma shower, its arc chamber drawing hole is located on a magnetic line of force of an AEF magnetic field perpendicular to the advancing direction of the ion beam and arranged so that its filament central axis and the axial direction of the arc chamber drawing hole coincide with the direction of the AEF magnetic field. COPYRIGHT: (C)2006,JPO&NCIPI
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