发明名称 Illumination optical device, photolithography machine, and exposure method
摘要 An illumination optical device, wherein a micro channel is not generated practically in a diffractive optical element arranged in an optical path of pulse laser light having high energy density. An illumination optical device having a light source ( 1 ) for supplying pulse laser light, wherein an irradiated plane (M) is illuminated with light from this light source. The illumination optical device comprises a diffractive optical element ( 4 ) arranged in an optical path between a light source and an irradiated plane, through which a light beam having an energy density of 1 mJ/cm<SUP>2</SUP>/pulse or more passes. The diffractive optical element is formed by an oxide crystal material such as quartz crystal.
申请公布号 US7307693(B2) 申请公布日期 2007.12.11
申请号 US20050521590 申请日期 2005.01.18
申请人 NIKON CORPORATION 发明人 TOYODA MITSUNORI
分类号 G02B5/18;G03B27/54;G02B1/02;G02B3/00;G02B19/00;G03B27/42;G03F7/20;H01L21/027 主分类号 G02B5/18
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