发明名称 |
Method of making photomask blank substrates |
摘要 |
A photomask blank substrate is made by polishing a starting substrate to a specific flatness in a principal surface region on a top surface of the substrate so as to form a polished intermediate product, then additionally polishing the intermediate product. Substrates made in this way exhibit a good surface flatness at the time of wafer exposure. When a photomask fabricated from a blank obtained from such a substrate is held on the mask stage of a wafer exposure system with a vacuum chuck, the substrate surface undergoes minimal warping, enabling exposure patterns of small geometry to be written onto wafers to good position and linewidth accuracies. |
申请公布号 |
US7344808(B2) |
申请公布日期 |
2008.03.18 |
申请号 |
US20040896946 |
申请日期 |
2004.07.23 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;NIKON CORPORATION |
发明人 |
NUMANAMI TSUNEO;NAKATSU MASAYUKI;MOGI MASAYUKI;HAGIWARA TSUNEYUKI;KONDO NAOTO |
分类号 |
G03F1/00;G03F1/14;B24B7/22;G03F1/08;G03F1/50;G03F1/60;H01L21/4763 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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