| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a magnetic device by which a magnetic thin film can be selectively etched and the productivity is improved, and to provide an apparatus of manufacturing the same. SOLUTION: A magnetic layer 51 containing at least one kind of elements selected from a group including iron, cobalt and nickel and a mask pattern 52 exposing the etching area 51E of the magnetic layer 51 are formed on a substrate S. The magnetic layer 51 corresponding to the etching area 51E is used as nucleus, and CNT including an inclusion piece 51a is grown, and then the CNT is removed from the substrate S. COPYRIGHT: (C)2008,JPO&INPIT
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