发明名称 |
Reduced pressure drying method and device of a substrate |
摘要 |
A reduced pressure drying method and device for a substrate are presented. Firstly, a substrate is placed in a sealed space; then the surface to-be-dried of the substrate is partitioned into a predetermined number of sealed regions; thereafter, the sealed regions are subjected to pressure reduction through gas extraction; finally, the sealed regions are dried through gas insufflation, and then the substrate is taken out from the sealed space. The method can perform reduced pressure drying to various-sized substrates, ensuring uniform pressure and humidity and avoiding formation of reduced pressure drying speckles. |
申请公布号 |
US9347706(B2) |
申请公布日期 |
2016.05.24 |
申请号 |
US201314362049 |
申请日期 |
2013.05.23 |
申请人 |
BOE TECHNOLOGY GROUP., LTD.;BEIJING BOE DISPLAY TECHNOLOGY CO., LTD. |
发明人 |
Wang Song;Wan Jiyu;Feng He;Wu Hongjiang |
分类号 |
F26B5/04;H01L21/67;H01L21/02 |
主分类号 |
F26B5/04 |
代理机构 |
Ladas & Parry LLP |
代理人 |
Ladas & Parry LLP |
主权项 |
1. A reduced pressure drying method for a substrate, wherein the method comprises following steps of:
S1: placing the substrate in a sealed space; S2: partitioning the sealed space into at least two sealed regions, on a surface of the substrate to-be-dried; S3: extracting gas from the sealed regions to reduce pressure; S4: blowing and drying the sealed regions, and taking out the substrate from the sealed space. |
地址 |
Beijing CN |