Photo-curable composition for imprints, pattern forming method and pattern

摘要

To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cm3 or larger;
Crosslink density={Σ(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity.

主权项

1. A photo-curable composition for imprints comprising a monofunctional monomer which is benzyl(meth)acrylate, a polyfunctional monomer and a photo-polymerization initiator,
which has a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by Formula (1) of 0.6 mmol/cm3 or larger;
Crosslink density={Σ(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity,  Formula (1): wherein the polyfunctional monomer is represented by the Formula (2) below: wherein A represents tricyclodecane, R1 represents a polymerizable group, and R2 represents a substituent; n1 represents an integer of 1 to 3, n2 represents an integer of 1 to 6, and n3 represents an integer of 0 to 5; when n2 is 1, at least one of (R2)s represents a polymerizable group.