TRANSISTOR STRUCTURE WITH SPECIFIC GATE AND PAD AREAS

摘要

An improved transistor design and methods of construction and testing for same. The novel transistor design method includes the steps of providing a transistor (10') with multiple common gate areas; connecting each gate area to a pad; and adjusting the ratio of the area of the pad to the total of the gate areas to provide a predetermined ratio. The ratio may be adjusted by adjusting the size of the gate, in a single gate implementation, or adjusting the number of gates in a multiple gate configuration. The novel transistor includes a substrate (12'), at least one source (26') disposed on the substrate; at least one drain (28') disposed on the substrate; and at least one gate (30') disposed on the substrate between the source and the drain. The gate has a first layer of at least partially conductive material of area Ag connected to a pad (34') of area Ap. In accordance with the present teachings, the antenna ratio R of the area of the pad Ap to the area of the gate Ag is a predetermined number. In practice, the ratio R would be chosen to be a minimum so that deleterious plasma currents attracted to the gate area would be reduced. In a particular implementation, the transistor includes plural gates each having a layer of at least partially conductive material of area Agn where n is any integer between 1 and N and where N is the total number of gates. In this case, the plural gates are interconnected and the ratio R is a predetermined number equal to Ap/Agtotal, where Agtotal is the sum of the areas Agn and n is any integer between 1 and N. The novel method for testing multiple gate transistors includes the steps of connecting a first terminal of each of said transistors to a ground; interconnecting a second terminal of each transistor and applying a first source of supply potential; and selectively applying a second source of supply potential to a third terminal of a selected transistor.