PHOTOMASK AND ITS PRODUCTION

摘要

PURPOSE:To easily produce a photomask having a resolution improving effect to an isolated pattern and excellent in acid and light resistance. CONSTITUTION:A Cr-SiO2 combined target is sputtered with a gas mixed with oxygen to form a thin-film 2 of a chromium oxide-silicon oxide mixture on a glass substrate 1. The compsn. of the thin film 2 is varied by varying the area ratio between Cr and SiO2 in the combined target and the transmissivity of the thin film 2 can be regulated by varying the compsn. of the thin film 2.