发明名称 DETECTING DEVICE FOR JUNCTION SEMICONDUCTOR WAFER
摘要 PURPOSE:To shorten a processing time and to improve productivity, by judging the void of a junction semiconductor wafer detected by a infrared-ray device provided at a wafer inspecting position, and providing a control part, in which the result is stored. CONSTITUTION:An infrared-ray detecting part 104 of a control part 15 receives infrared rays 103b, which are transmitted through a wafer 100 and detects the void of the wafer. Infrared rays 103a is emitted from an infrared ray source 102 at a wafer inspecting position. The void of the detected wafer is judged at a specified inspecting level by image processing. The result is stored in a memory part 25. Then, based on the stored result, e.g., laterally moving belts 37 and 37 are lifted high than the level of the surface of belts 27 and 27. The wafer having the defective void is mounted on the blet 37 and carried. The defective wafer is accommodated in a wafer carrier in a defective wafer accommodating elevator mechanism 57 which is different from the sending destination of the belts 27 and 27. Since the laterally moving belts 37 and 37 are kept at the lower level, the good wafers are mounted on the belts 27 and 27 and accommodated in the wafer carrier of a good wafer accommodating elevator mechanism 47.
申请公布号 JPS62261138(A) 申请公布日期 1987.11.13
申请号 JP19860103807 申请日期 1986.05.08
申请人 TOSHIBA CORP;TOSHIBA MICRO COMPUT ENG CORP 发明人 YOSHIKAWA KIYOSHI;TSUKADA MITSUKI;HOSHI TADAHIDE;MINOHOSHI TOMIO
分类号 H01L21/66;H01L21/67;H01L21/677;H01L21/68 主分类号 H01L21/66
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