发明名称 Semiconductor memory device
摘要 A semiconductor integrated circuit memory device in which FET memory transistor cells are disposed in a matrix wherein the source diffusion channels form a data path for each column of cells while the drain diffusion channels and gate electrodes are used for row and column addressing, respecitvely, and has extremely reliable ohmic contacts by virtue of a different pattern of the field insulating film used in the manufacturing process, as a result of which the depth of a source contact hole and a drain contact hole are substantially equal.
申请公布号 US4707717(A) 申请公布日期 1987.11.17
申请号 US19850801805 申请日期 1985.11.26
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HIRABAYASHI, KAZUO;YAMAMOTO, MAKOTO
分类号 H01L21/762;H01L21/768;H01L21/8246;H01L21/8247;H01L23/522;H01L23/528;H01L27/10;H01L27/112;H01L29/788;H01L29/792;(IPC1-7):H01L29/78;H01L21/88;H01L29/44;H01L21/76 主分类号 H01L21/762
代理机构 代理人
主权项
地址