发明名称 SETTING OF CLOTH HAVING STERIC STRUCTURE
摘要 PURPOSE:To enable the setting of a cloth to eliminate the bent mark and the deformation formed in the steric structure by applying a water-soluble polymer to a base material, applying water to the obtained steric structure cloth and heat-treating the product under application of a shearing deformation to the base. CONSTITUTION:A water-soluble polymer such as PVA or polyvinyl acetate is applied in an amount of >=0.1wt.% to filaments of synthetic fiber, glass fiber, carbon fiber, etc., constituting a cloth having steric structure to obtain a woven fabric having steric structure and consisting of e.g. a surface base cloth 1, a back base cloth 2 and connection yarns 7. Water is applied to the woven fabric having steric structure, a shearing deformation is applied to the fabric and the fabric is subjected to one or more heat-treatment procedures to reform the bent-mark and deformation of the steric structure fabric and enable the formation of a formed product having extremely high uniformity by a higher- order processing such as resin finishing.
申请公布号 JPH05287679(A) 申请公布日期 1993.11.02
申请号 JP19920081203 申请日期 1992.04.03
申请人 UNITIKA LTD 发明人 FUJII MINORU
分类号 D03D15/00;D06M15/333;D06M15/70;D06M15/71;D06M101/00;D06M101/40;(IPC1-7):D06M15/333 主分类号 D03D15/00
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