发明名称 Molecular beam source and molecular beam epitaxy apparatus
摘要 A molecular beam source comprising a crucible having an opening, and a heater mounted to the crucible for evaporating by heating a molecular beam generating material accommodated in the crucible to emit a molecular beam from the opening, wherein the crucible has an accommodating section for accommodating the molecular beam generating material, a bent portion provided between the opening and the accommodating section so that the molecular beam generating material accommodated in the accommodating section does not face the opening directly, and a narrowed portion between the bent portion and the opening.
申请公布号 US6475278(B2) 申请公布日期 2002.11.05
申请号 US20010773571 申请日期 2001.02.02
申请人 SHARP KABUSHIKI KAISHA 发明人 NAKABAYASHI TAKAYA;MAKINO SHUJI
分类号 H01L21/203;C30B23/06;C30B23/08;H01L21/20;(IPC1-7):C30B35/00 主分类号 H01L21/203
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