DOLLAR M(C)METHOD FOR PRODUCING INCLINED FLANK PATTERNS BY PHOTOLITHOGRAPHY

摘要

The invention relates to a lithographic method for producing patterns in a photosensitive resin layer (601) placed on a substrate (600). Said patterns (607) comprises flanks (608) inclined with respect to a normal (n) to the main substrate plane forming an inclination angle ( theta ) which is much greater than the inclination angle of the patters obtainable by the previous state of the art. A device for carrying out the inventive method is also disclosed.