| 摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that a pattern for managing a focus is different in shape from that of a circuit pattern of a semiconductor device, so that a focus characteristic diverges and focus stability in a most important circuit pattern is insufficient. SOLUTION: A quantity D of a step is measured between a step low area 1 and a step high area 2 on a wafer. Next, a focus confirmation pattern 3 is formed on the wafer. Then the dimension L1 of the focus confirmation pattern 3 formed on the step low area 1 and the dimension L2 of the focus confirmation pattern 3 formed on the step high area 2 are measured by a dimensional measuring device. Furthermore, a relationship between the level difference D and the dimensions L1 and L2 is compared with a focus dimension theoretical curve 11 that is calculated by measuring a relationship between the focal position of the focus confirmation pattern and the pattern dimension beforehand, thereby finding out an appropriate focus position. COPYRIGHT: (C)2005,JPO&NCIPI
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