| 摘要 |
PROBLEM TO BE SOLVED: To provide test method and inspection device for achieving inspection and evaluation of sample data, and moreover with high throughput, as well as higher reliability. SOLUTION: This electron beam system comprises a charged particle beam generation means 71 for generating a charged particle beam, a primary optical system 72, which allows a plurality of the primary charged particle beams to be scanned and then irradiated on the substrate, a secondary optical system 74 into which the secondary charged particle beams, discharged from the substrate by the irradiation of the charged particle beam are injected, a detection system 76 for detecting the secondary charged particle beams injected into the secondary optical system for converting them into electrical signals, and a processing control system 77 for evaluating the substrate, based on the electrical signals. By dividing the pattern formation face into several areas and then select-joining the areas of the divided areas, evaluation of the pattern forming face where an entire pattern formation is made by forming patterns for each area is conducted. COPYRIGHT: (C)2006,JPO&NCIPI
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