| 摘要 |
The present invention has an object to provide a surface treatment apparatus, which can form a high-quality film at a high speed while preventing deterioration of the film due to collisions of charged particles. The surface treatment apparatus ( 1 ) of the present invention comprises a casing ( 2 ) partitioned to two chambers, that is, a plasma generating chamber ( 3 ) provided with plasma generating electrodes ( 5, 5 ') and a substrate processing chamber ( 4 ) provided with a substrate supporting table ( 8 ). A plasma vent ( 6 ) is formed in the electrode ( 5 ') that composes the partition between the chambers ( 3, 4 ). A conductive mesh-shaped sheet ( 9 ) is disposed in a direction across the plasma between the plasma vent ( 6 ) and a substrate (S) on the substrate supporting table ( 8 ). The sheet ( 9 ), to which a variable bias is applied, captures charged particles in the plasma so that the charged particles can be excluded from the plasma.
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