LINEAR EVAPORATION SOURCE

摘要

Disclosed is a linear evaporation source. The linear evaporation source according to an embodiment of the present invention includes: a crucible which is charged with an evaporation material; a cover which comprises a number of nozzles forming a path where the evaporation material in the crucible is evaporated to move toward the substrate, and is combined to an aperture at one side of the crucible; and a nozzle heater which is arranged adjacently to the nozzle, and heats the vicinity of the nozzle so as to prevent the nozzle from being clogged due to the evaporation material or to prevent the evaporation material stacked outside the nozzle from permeating into the nozzle. The linear evaporation source can secure uniformity of thin film thickness as to a substrate, by preventing generation of a clogging phenomenon of the nozzle.