| 摘要 |
PROBLEM TO BE SOLVED: To provide technology capable of suppressing generation of particles and abnormal discharge on a mounting table around which a ring member made of an insulation material is disposed.SOLUTION: A mounting table 3 provided in a plasma processing apparatus includes: a prismatic-shaped mounting table body made of metal; a recessed part 61 forming an engagement part formed on a side of the mounting table body; and a positioning member 7 attached to the mounting table body engaged with the recessed part 61. Protrusions 72, 73 are provided on the positioning member 7, and a ring member 5 is mounted so as to allow the protrusions 72, 73 to be fit recessed parts 55, 56 formed on an underside of the ring member 5. Accordingly, a top surface of the ring member 5 is formed as a flat surface in which a vertical through hole is not provided, and gaps as a cause of generation of particles and gaps relating to such abnormal discharge in a case of fixing the mounting table by screws from the top surface of the ring member are not formed, thereby suppressing the generation of particles and abnormal discharge.SELECTED DRAWING: Figure 5 |
