Rotary magnetron magnet bar and apparatus containing the same for high target utilization

摘要

An apparatus for coating a substrate is provided that includes a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.

主权项

1. An apparatus for coating a substrate comprising:
a racetrack-shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions; a tubular target having an end and in proximity to said plasma source; a tubular backing cathode to which said target is secured, said cathode and said tubular target being rotatable about a central axis; and a plurality of magnets arranged inside said cathode wherein said plurality of magnets comprise a distal magnet positioned with a first polarity orientation adjacent to said target, and at least one proximal magnet of opposite polarity orientation adjacent to said target, and an intermediate magnet between said distal magnet and said at least one proximal magnet, wherein said intermediate magnet has a polar orientation different than that of said distal magnet, said plurality of magnets arranged to move an erosion zone, said erosion zone is aligned with the least one terminal turnaround toward the end of said target as said target is utilized to deposit the coating on the substrate.