| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a carbon film, capable of reducing an electric resistance in the carbon laminating direction and improving a film deposition rate without generating degradation, etc., of carbon film quality.SOLUTION: A method for manufacturing a carbon film C comprises: generating a plasma P by applying a pulse voltage to a target substrate 14 in a vacuum chamber having an introduced sputtering atmosphere gas; and depositing the carbon film C on a substrate 13 arranged opposite to the target substrate 14 at an interval by sputtering. The method includes the steps of: adjusting an electric discharge impedance in the vacuum chamber so as to be 50 Ω or less when generating the plasma P; and adjusting an electric power density flowing into the target substrate 14 to be 85 W/cmor more by applying the pulse voltage.SELECTED DRAWING: Figure 3 |
